The Resource Advances in atomic, molecular, and optical physics, Volume 43, Fundamentals of plasma chemistry, edited by Benjamin Bederson, Herbert Walther, (electronic resource)

Advances in atomic, molecular, and optical physics, Volume 43, Fundamentals of plasma chemistry, edited by Benjamin Bederson, Herbert Walther, (electronic resource)

Label
Advances in atomic, molecular, and optical physics, Volume 43, Fundamentals of plasma chemistry
Title
Advances in atomic, molecular, and optical physics
Title number
Volume 43
Title part
Fundamentals of plasma chemistry
Statement of responsibility
edited by Benjamin Bederson, Herbert Walther
Contributor
Subject
Genre
Language
  • eng
  • eng
Summary
This series, established in 1965, is concerned with recent developments in the general area of atomic, molecular, and optical physics. The field is in a state of rapid growth, as new experimental and theoretical techniques are used on many old and new problems. Topics covered also include related applied areas, such as atmospheric science, astrophysics, surface physics, and laser physics.Articles are written by distinguished experts who are active in their research fields. The articles contain both relevant review material as well as detailed descriptions of important recent developments.<
Is Subseries of
Cataloging source
MiAaPQ
Dewey number
541.0424
Illustrations
illustrations
Index
index present
Language note
English
LC call number
QC446.2
LC item number
.A3843 2000
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Bederson, Benjamin
  • Walther, Herbert
Series statement
Advances in atomic, molecular, and optical physics
Series volume
43
http://library.link/vocab/subjectName
  • Nuclear physics
  • Physical optics
  • Atoms
  • Molecules
Label
Advances in atomic, molecular, and optical physics, Volume 43, Fundamentals of plasma chemistry, edited by Benjamin Bederson, Herbert Walther, (electronic resource)
Instantiates
Publication
Note
Description based upon print version of record
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
cr
Content category
text
Content type code
txt
Contents
  • Front Cover; Advances in Atomic, Molecular, and Optical Physics, Volume 43; Copyright Page; Contents; Contributors; Chapter 1. Plasma Processing of Materials and Atomic, Molecular, and Optical Physics. An Introduction; I. Introduction; II. Plasma Formation and Collision Processes; III. Plasma Diagnosis and Modeling; IV. Pertinent Topics from Atomic, Molecular, and Optical Physics; V. Acknowledgments; VI. References; Chapter 2. The Boltzmann Equation and Transport Coefficients of Electrons in Weakly Ionized Plasmas; I. Introduction; II. Kinetic Description of the Electrons
  • III. Electron Kinetics in Time- and Space-Independent PlasmasIV. Electron Kinetics in Time-Dependent Plasmas; V. Electron Kinetics in Space-Dependent Plasmas; VI. Concluding Remarks; VII. Acknowledgments; VIII. References; Chapter 3. Electron Collision Data for Plasma Chemistry Modeling; I. Dedication; II. Introduction; III. Sources of Data and Interpretations; IV. Discussion of Data for Specific Processes and Species; V. Concluding Remarks: Journals, Databases, and the World Wide Web; VI. Acknowledgements; VII. References
  • Chapter 4. Electron-Molecule Collisions in Low-Temperature Plasmas: The Role of TheoryI. Introduction; II. Types of Cross Sections; III. Cross-Section Calculations at Low Energy; IV. Methods in Current Use; V. Areas for Future Progress; VI. Acknowledgments; VII. References; Chapter 5. Electron Impact Ionization of Organic Silicon Compounds; I. Introduction; II. Ionization-Cross-Section Measurements; III. Semiempirical Calculation of Total Single Ionization Cross Sections; IV. Ionization Cross Sections of SiHx (x = 1 to 4) and of Selected Si-Organic Compounds
  • V. Comparison with Ion Formation Processes and Ion Abundances in PlasmasVI. Summary; VII. Acknowledgments; VIII. References; Chapter 6. Kinetic Energy Dependence of Ion-Molecule Reactions Related to Plasma Chemistry; I. Introduction; II. Experimental Methods; III. Reactions with Silane (SiH4); IV. Reactions Involving Organosilanes; V. Reactions with Silicon Tetrafluoride (SiF4); VI. Reactions with Silicon Tetrachloride (SiCl4); VII. Reactions with Fluorocarbons (CF4 and C2F6); VIII. Miscellaneous Thermochemical Studies; IX. Conclusions; X. Acknowledgment; XI. References
  • Chapter 7. Physicochemical Aspects of Atomic and Molecular Processes in Reactive PlasmasI. Introduction; II. Atomic and Molecular Processes in Reactive Plasmas; III. Overview and Comments on Free Radical Reactions in Reactive Plasmas; IV. Deexcitation of Excited Rare Gas Atoms by Molecules Containing Group IV elements; V. Comments on Atomic and Molecular Processes in Reactive Plasmas from Physicochemical Viewpoints; VI. References; Chapter 8. Ion-Molecule Reactions; I. Introduction; II. Reaction Rate Constants of Ion-Molecule Reactions; III. Types of Ion-Molecule Processes
  • IV. Effect of Internal Energy and Temperature on IM Processes
Dimensions
unknown
Extent
1 online resource (439 p.)
Form of item
online
Isbn
9780080561547
Media category
computer
Media type code
c
Specific material designation
remote
System control number
  • (EBL)404342
  • (OCoLC)437245538
  • (SSID)ssj0000329512
  • (PQKBManifestationID)12081663
  • (PQKBTitleCode)TC0000329512
  • (PQKBWorkID)10309024
  • (PQKB)10391472
  • (MiAaPQ)EBC404342
  • (EXLCZ)991000000000553415
Label
Advances in atomic, molecular, and optical physics, Volume 43, Fundamentals of plasma chemistry, edited by Benjamin Bederson, Herbert Walther, (electronic resource)
Publication
Note
Description based upon print version of record
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
cr
Content category
text
Content type code
txt
Contents
  • Front Cover; Advances in Atomic, Molecular, and Optical Physics, Volume 43; Copyright Page; Contents; Contributors; Chapter 1. Plasma Processing of Materials and Atomic, Molecular, and Optical Physics. An Introduction; I. Introduction; II. Plasma Formation and Collision Processes; III. Plasma Diagnosis and Modeling; IV. Pertinent Topics from Atomic, Molecular, and Optical Physics; V. Acknowledgments; VI. References; Chapter 2. The Boltzmann Equation and Transport Coefficients of Electrons in Weakly Ionized Plasmas; I. Introduction; II. Kinetic Description of the Electrons
  • III. Electron Kinetics in Time- and Space-Independent PlasmasIV. Electron Kinetics in Time-Dependent Plasmas; V. Electron Kinetics in Space-Dependent Plasmas; VI. Concluding Remarks; VII. Acknowledgments; VIII. References; Chapter 3. Electron Collision Data for Plasma Chemistry Modeling; I. Dedication; II. Introduction; III. Sources of Data and Interpretations; IV. Discussion of Data for Specific Processes and Species; V. Concluding Remarks: Journals, Databases, and the World Wide Web; VI. Acknowledgements; VII. References
  • Chapter 4. Electron-Molecule Collisions in Low-Temperature Plasmas: The Role of TheoryI. Introduction; II. Types of Cross Sections; III. Cross-Section Calculations at Low Energy; IV. Methods in Current Use; V. Areas for Future Progress; VI. Acknowledgments; VII. References; Chapter 5. Electron Impact Ionization of Organic Silicon Compounds; I. Introduction; II. Ionization-Cross-Section Measurements; III. Semiempirical Calculation of Total Single Ionization Cross Sections; IV. Ionization Cross Sections of SiHx (x = 1 to 4) and of Selected Si-Organic Compounds
  • V. Comparison with Ion Formation Processes and Ion Abundances in PlasmasVI. Summary; VII. Acknowledgments; VIII. References; Chapter 6. Kinetic Energy Dependence of Ion-Molecule Reactions Related to Plasma Chemistry; I. Introduction; II. Experimental Methods; III. Reactions with Silane (SiH4); IV. Reactions Involving Organosilanes; V. Reactions with Silicon Tetrafluoride (SiF4); VI. Reactions with Silicon Tetrachloride (SiCl4); VII. Reactions with Fluorocarbons (CF4 and C2F6); VIII. Miscellaneous Thermochemical Studies; IX. Conclusions; X. Acknowledgment; XI. References
  • Chapter 7. Physicochemical Aspects of Atomic and Molecular Processes in Reactive PlasmasI. Introduction; II. Atomic and Molecular Processes in Reactive Plasmas; III. Overview and Comments on Free Radical Reactions in Reactive Plasmas; IV. Deexcitation of Excited Rare Gas Atoms by Molecules Containing Group IV elements; V. Comments on Atomic and Molecular Processes in Reactive Plasmas from Physicochemical Viewpoints; VI. References; Chapter 8. Ion-Molecule Reactions; I. Introduction; II. Reaction Rate Constants of Ion-Molecule Reactions; III. Types of Ion-Molecule Processes
  • IV. Effect of Internal Energy and Temperature on IM Processes
Dimensions
unknown
Extent
1 online resource (439 p.)
Form of item
online
Isbn
9780080561547
Media category
computer
Media type code
c
Specific material designation
remote
System control number
  • (EBL)404342
  • (OCoLC)437245538
  • (SSID)ssj0000329512
  • (PQKBManifestationID)12081663
  • (PQKBTitleCode)TC0000329512
  • (PQKBWorkID)10309024
  • (PQKB)10391472
  • (MiAaPQ)EBC404342
  • (EXLCZ)991000000000553415

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