The Resource Design for Manufacturability with Advanced Lithography, by Bei Yu, David Z. Pan, (electronic resource)

Design for Manufacturability with Advanced Lithography, by Bei Yu, David Z. Pan, (electronic resource)

Label
Design for Manufacturability with Advanced Lithography
Title
Design for Manufacturability with Advanced Lithography
Statement of responsibility
by Bei Yu, David Z. Pan
Creator
Contributor
Author
Provider
Subject
Language
eng
Summary
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography
http://library.link/vocab/creatorName
Yu, Bei
Image bit depth
0
LC call number
TK7888.4
Literary form
non fiction
http://library.link/vocab/relatedWorkOrContributorName
  • Pan, David Z.
  • SpringerLink
http://library.link/vocab/subjectName
  • Engineering
  • Microprocessors
  • Electronics
  • Microelectronics
  • Electronic circuits
  • Engineering
  • Circuits and Systems
  • Processor Architectures
  • Electronics and Microelectronics, Instrumentation
Label
Design for Manufacturability with Advanced Lithography, by Bei Yu, David Z. Pan, (electronic resource)
Instantiates
Publication
Antecedent source
mixed
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Color
not applicable
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Contents
Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.-
Dimensions
unknown
Edition
1st ed. 2016.
Extent
XI, 164 p. 100 illus., 91 illus. in color.
File format
multiple file formats
Form of item
electronic
Isbn
9783319203850
Level of compression
uncompressed
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other control number
10.1007/978-3-319-20385-0
Other physical details
online resource.
Quality assurance targets
absent
Reformatting quality
access
Specific material designation
remote
System control number
(DE-He213)978-3-319-20385-0
Label
Design for Manufacturability with Advanced Lithography, by Bei Yu, David Z. Pan, (electronic resource)
Publication
Antecedent source
mixed
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Color
not applicable
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Contents
Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.-
Dimensions
unknown
Edition
1st ed. 2016.
Extent
XI, 164 p. 100 illus., 91 illus. in color.
File format
multiple file formats
Form of item
electronic
Isbn
9783319203850
Level of compression
uncompressed
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other control number
10.1007/978-3-319-20385-0
Other physical details
online resource.
Quality assurance targets
absent
Reformatting quality
access
Specific material designation
remote
System control number
(DE-He213)978-3-319-20385-0

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