The Resource Dielectric films for advanced microelectronics, edited by Mikhail Baklanov, Martin Green, and Karen Maex

Dielectric films for advanced microelectronics, edited by Mikhail Baklanov, Martin Green, and Karen Maex

Label
Dielectric films for advanced microelectronics
Title
Dielectric films for advanced microelectronics
Statement of responsibility
edited by Mikhail Baklanov, Martin Green, and Karen Maex
Contributor
Subject
Language
eng
Cataloging source
DLC
Illustrations
illustrations
Index
index present
LC call number
TK7871.15.F5
LC item number
D54 2007
Literary form
non fiction
Nature of contents
bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Baklanov, Mikhail
  • Green, Martin
  • Maex, Karen
Series statement
Wiley series in materials for electronic and optoelectronic applications.
http://library.link/vocab/subjectName
  • Dielectric films
  • Microelectronics
Label
Dielectric films for advanced microelectronics, edited by Mikhail Baklanov, Martin Green, and Karen Maex
Instantiates
Publication
Bibliography note
Includes bibliographical references and index
Contents
  • Ellipsometric porosimetry
  • Mikhail R. Baklanov
  • Mechanical and transport properties of low-k dielectrics
  • J. L. Plawsky ... [et al.]
  • Integration of low-k dielectric films in damascene processes
  • R. J. O. M. Hoofman ... [et al.]
  • ONO structures and oxynitrides in modern microelectronics : material science, characterization and application
  • Yakov Roizin, Vladimir Gritsenko
  • Material engineering of high-k gate dielectrics
  • Akira Toriumi, Koji Kita
  • Low and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition
  • Physical characterization of ultra-thin high-k dielectric
  • T. Conard, H. Bender, W. Vandervorst
  • Electrical characterization of advanced gate dielectrics
  • Robin Degraeve ... [et al.]
  • Integration issues of high-k gate dielectrics
  • Yasuo Nara
  • Anisotropic conductive film (ACF) for advanced microelectronic interconnects
  • Yi Li, C. P. Wong
  • A. Grill
  • Spin-on dielectric materials
  • Geraud Dubois, Robert D. Miller, Willi Volksen
  • Positron annihilation spectroscopy
  • David W. Gidley, Hua-Gen Peng, Richard Vallery
  • Structure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation
  • Christopher L. Soles ... [et al.]
Dimensions
26 cm.
Extent
xxii, 486 p.
Isbn
9780470013601
Isbn Type
(hbk.)
Lccn
20060307 40
Other physical details
ill.
System control number
  • (OCoLC)71581699
  • (OCoLC)71581699
Label
Dielectric films for advanced microelectronics, edited by Mikhail Baklanov, Martin Green, and Karen Maex
Publication
Bibliography note
Includes bibliographical references and index
Contents
  • Ellipsometric porosimetry
  • Mikhail R. Baklanov
  • Mechanical and transport properties of low-k dielectrics
  • J. L. Plawsky ... [et al.]
  • Integration of low-k dielectric films in damascene processes
  • R. J. O. M. Hoofman ... [et al.]
  • ONO structures and oxynitrides in modern microelectronics : material science, characterization and application
  • Yakov Roizin, Vladimir Gritsenko
  • Material engineering of high-k gate dielectrics
  • Akira Toriumi, Koji Kita
  • Low and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition
  • Physical characterization of ultra-thin high-k dielectric
  • T. Conard, H. Bender, W. Vandervorst
  • Electrical characterization of advanced gate dielectrics
  • Robin Degraeve ... [et al.]
  • Integration issues of high-k gate dielectrics
  • Yasuo Nara
  • Anisotropic conductive film (ACF) for advanced microelectronic interconnects
  • Yi Li, C. P. Wong
  • A. Grill
  • Spin-on dielectric materials
  • Geraud Dubois, Robert D. Miller, Willi Volksen
  • Positron annihilation spectroscopy
  • David W. Gidley, Hua-Gen Peng, Richard Vallery
  • Structure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation
  • Christopher L. Soles ... [et al.]
Dimensions
26 cm.
Extent
xxii, 486 p.
Isbn
9780470013601
Isbn Type
(hbk.)
Lccn
20060307 40
Other physical details
ill.
System control number
  • (OCoLC)71581699
  • (OCoLC)71581699

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