The Resource Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California

Label
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
Title
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
Contributor
Contributor
Subject
Genre
Language
  • eng
  • eng
Cataloging source
PQKB
http://bibfra.me/vocab/relation/contentprovider
  • l-5VazgSgAg
  • TtW26B37Ca0
  • FdtBH5_H7QI
  • wnV9GxPBBbQ
Dewey number
621.3815/31
Language note
English
LC call number
TK7874.E48352 1996
http://library.link/vocab/relatedWorkOrContributorName
  • Seeger, David E
  • SEMATECH (Organization)
  • Semiconductor Equipment and Materials International
  • Society of Photo-optical Instrumentation Engineers
  • Society of Photo Optical Instrumentation Engineers
Series statement
Proceedings / SPIE--the International Society for Optical Engineering Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI
http://library.link/vocab/subjectName
  • Integrated circuits
  • Extreme ultraviolet lithography
  • Lithography, Electron beam
  • X-ray lithography
  • Ion beam lithography
  • Electrical & Computer Engineering
  • Engineering & Applied Sciences
  • Electrical Engineering
Label
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
Instantiates
Note
Bibliographic Level Mode of Issuance: Monograph
Carrier category
online resource
Carrier category code
  • cr
Content category
text
Content type code
  • txt
Form of item
online
Media category
computer
Media type code
  • c
System control number
  • (SSID)ssj0001230244
  • (PQKBManifestationID)12394287
  • (PQKBTitleCode)TC0001230244
  • (PQKBWorkID)11223235
  • (PQKB)10620704
  • (EXLCZ)993360000000360937
Label
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
Note
Bibliographic Level Mode of Issuance: Monograph
Carrier category
online resource
Carrier category code
  • cr
Content category
text
Content type code
  • txt
Form of item
online
Media category
computer
Media type code
  • c
System control number
  • (SSID)ssj0001230244
  • (PQKBManifestationID)12394287
  • (PQKBTitleCode)TC0001230244
  • (PQKBWorkID)11223235
  • (PQKB)10620704
  • (EXLCZ)993360000000360937

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