The Resource Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California

Label
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California
Title
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California
Contributor
Contributor
Subject
Genre
Language
  • eng
  • eng
Cataloging source
PQKB
http://bibfra.me/vocab/relation/contentprovider
  • x4aL93Do1FQ
  • G0YD26kc9CU
  • uKduZE55ygw
Dewey number
621.3815/31
Language note
English
LC call number
TK7874.E4835 1995
http://library.link/vocab/relatedWorkOrContributorName
  • Warlaumont, John M
  • Society of Photo Optical Instrumentation Engineers
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International
Series statement
Proceedings / SPIE--the International Society for Optical Engineering Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V
http://library.link/vocab/subjectName
  • Integrated circuits
  • Extreme ultraviolet lithography
  • Lithography, Electron beam
  • X-ray lithography
  • Ion beam lithography
  • Electrical & Computer Engineering
  • Engineering & Applied Sciences
  • Electrical Engineering
Label
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California
Instantiates
Note
Bibliographic Level Mode of Issuance: Monograph
Carrier category
online resource
Carrier category code
cr
Content category
text
Content type code
txt
Form of item
online
Media category
computer
Media type code
c
System control number
  • (SSID)ssj0001230243
  • (PQKBManifestationID)12475169
  • (PQKBTitleCode)TC0001230243
  • (PQKBWorkID)11202716
  • (PQKB)11032651
  • (EXLCZ)993360000000360700
Label
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California
Note
Bibliographic Level Mode of Issuance: Monograph
Carrier category
online resource
Carrier category code
cr
Content category
text
Content type code
txt
Form of item
online
Media category
computer
Media type code
c
System control number
  • (SSID)ssj0001230243
  • (PQKBManifestationID)12475169
  • (PQKBTitleCode)TC0001230243
  • (PQKBWorkID)11202716
  • (PQKB)11032651
  • (EXLCZ)993360000000360700

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