The Resource Handbook of thin-film deposition processes and techniques : principles, methods, equipment, and applications, edited by Klaus K. Schuegraf

Handbook of thin-film deposition processes and techniques : principles, methods, equipment, and applications, edited by Klaus K. Schuegraf

Label
Handbook of thin-film deposition processes and techniques : principles, methods, equipment, and applications
Title
Handbook of thin-film deposition processes and techniques
Title remainder
principles, methods, equipment, and applications
Statement of responsibility
edited by Klaus K. Schuegraf
Contributor
Subject
Genre
Language
eng
Related
Cataloging source
DLC
Illustrations
illustrations
Index
index present
LC call number
TK7872.T55
LC item number
H36 1988
Literary form
non fiction
Nature of contents
  • bibliography
  • handbooks
http://library.link/vocab/relatedWorkOrContributorName
Schuegraf, Klaus K
http://library.link/vocab/subjectName
  • Thin film devices
  • Dispositifs à couches minces
  • Technologie
  • Electronique
  • Manuels
  • Thin film devices
  • Couches minces
  • Aufdampfen
  • Dünnschichttechnik
  • Dünne Schicht
Label
Handbook of thin-film deposition processes and techniques : principles, methods, equipment, and applications, edited by Klaus K. Schuegraf
Instantiates
Publication
Bibliography note
Includes bibliographies and index
Carrier category
volume
Carrier category code
  • nc
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
  • 3.
  • Low pressure chemical vapor deposition
  • Ronald C. Rossi
  • 4.
  • Plasma-assisted chemical vapor deposition
  • V.S. Nguyen
  • 5.
  • Microwave electron cyclotron resonance plasma chemical vapor deposition
  • Seitaro Matsuo
  • 6.
  • 1.
  • Molecular beam epitaxy : equipment and practice
  • Walter S. Knodle
  • and
  • Robert Chow
  • 7.
  • Metal-organic chemical vapor deposition : technology and equipment
  • J.L. Zilko
  • 8.
  • Photochemical vapor deposition
  • Russell L. Abber
  • Deposition technologies and applications : introduction and overview
  • 9.
  • Introduction to sputtering
  • Brian Chapman
  • and
  • Stefano Mangano
  • 10.
  • Laser and electron beam assisted processing
  • Cameron A. Moore,
  • Zeng-qu Yu,
  • Lance R. Thompson,
  • Werner Kern
  • and
  • George J. Colliins
  • and
  • Klaus K. Schuegraf
  • 2.
  • Silicon epitaxy by chemical vapor deposition
  • Martin L. Hammond
  • John R. McNeil,
  • James J. McNally
  • and
  • Paul D. Reader
  • 13.
  • Plasma and elevated pressure oxidation in very large scale integration and ultra large scale integration
  • Arnold Reisman
  • Index
  • 11.
  • Ionized cluster beam deposition
  • Isao Yamada,
  • Toshinori Takagi,
  • and
  • Peter Younger
  • 12.
  • Ion beam deposition
Dimensions
25 cm
Extent
xvii, 413 pages
Isbn
9780815511533
Lccn
87034702
Media category
unmediated
Media MARC source
rdamedia
Media type code
  • n
Other physical details
illustrations
System control number
  • (OCoLC)17234252
  • (OCoLC)ocm17234252
Label
Handbook of thin-film deposition processes and techniques : principles, methods, equipment, and applications, edited by Klaus K. Schuegraf
Publication
Bibliography note
Includes bibliographies and index
Carrier category
volume
Carrier category code
  • nc
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
  • 3.
  • Low pressure chemical vapor deposition
  • Ronald C. Rossi
  • 4.
  • Plasma-assisted chemical vapor deposition
  • V.S. Nguyen
  • 5.
  • Microwave electron cyclotron resonance plasma chemical vapor deposition
  • Seitaro Matsuo
  • 6.
  • 1.
  • Molecular beam epitaxy : equipment and practice
  • Walter S. Knodle
  • and
  • Robert Chow
  • 7.
  • Metal-organic chemical vapor deposition : technology and equipment
  • J.L. Zilko
  • 8.
  • Photochemical vapor deposition
  • Russell L. Abber
  • Deposition technologies and applications : introduction and overview
  • 9.
  • Introduction to sputtering
  • Brian Chapman
  • and
  • Stefano Mangano
  • 10.
  • Laser and electron beam assisted processing
  • Cameron A. Moore,
  • Zeng-qu Yu,
  • Lance R. Thompson,
  • Werner Kern
  • and
  • George J. Colliins
  • and
  • Klaus K. Schuegraf
  • 2.
  • Silicon epitaxy by chemical vapor deposition
  • Martin L. Hammond
  • John R. McNeil,
  • James J. McNally
  • and
  • Paul D. Reader
  • 13.
  • Plasma and elevated pressure oxidation in very large scale integration and ultra large scale integration
  • Arnold Reisman
  • Index
  • 11.
  • Ionized cluster beam deposition
  • Isao Yamada,
  • Toshinori Takagi,
  • and
  • Peter Younger
  • 12.
  • Ion beam deposition
Dimensions
25 cm
Extent
xvii, 413 pages
Isbn
9780815511533
Lccn
87034702
Media category
unmediated
Media MARC source
rdamedia
Media type code
  • n
Other physical details
illustrations
System control number
  • (OCoLC)17234252
  • (OCoLC)ocm17234252

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